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Nanotechnology and Advanced Spectroscopy Team

Clean Room Facilities

Class 10000 Cleanroom (600 ft.2)

  • N2 glovebox with magnetron sputtering gun and thermal evaporator, spin coater and stereomicroscope with a CCD camera
  • Barrel Plasma cleaner
  • Reactive Ion Etcher
  • Nanonex Nanoimprint Lithography system
  • Wet Process Station (8 ft. long): a sink with DI water, a three basin rinse station and a hot water bath, providing Class 100 work environment and two filtered nitrogen blow guns
  • Laminar Flow Hood (8 ft.) providing class 100
  • Chemical Fume Hood
  • Semiconductor Optical Probe Station housed in glovebox connected to device fabrication glovebox
  • Semiconductor Device Analyzer (Agilent)

For more information on nanomaterials devices projects, please visit the Exploratory Devices section of Our Research.

August 2010

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