Clean Room Facilities

Class 10000 Cleanroom (600 ft.2)

• N2 glovebox with magnetron sputtering gun and thermal evaporator, spin coater and stereomicroscope with a CCD camera
• Barrel Plasma cleaner
• Reactive Ion Etcher
• Nanonex Nanoimprint Lithography system
• Wet Process Station (8 ft. long): a sink with DI water, a three basin rinse station and a hot water bath, providing Class 100 work environment and two filtered nitrogen blow guns
• Laminar Flow Hood (8 ft.) providing class 100
• Chemical Fume Hood
• Semiconductor Optical Probe Station housed in glovebox connected to device fabrication glovebox
• Semiconductor Device Analyzer (Agilent)

For more information on nanomaterials devices projects, please visit the Exploratory Devices section of Our Research.

August 2010